China Material Technology

Company Description

China Material Technology Co., Ltd. (MAT-CN)  base on Chinese mainland, in the supply of sputtering targets and advance materials to industrial consumers and lab worldwide for many years in China. MAT-CN offers a wide range of specialist metals, alloys and inorganic chemical compounds.
 
MAT-CN have lots of fabrication methods about material, and China Material Technology will select the best ways to manufacture products base on raw materials speciafication. Some available methods show as below: Vacuum Induction Melting (VIM), Vacuum induced levitation melting furnace Vacuum Sintering, Vacuum Melting Casting, Vacuum Arc Melting, Hot Pressing (HP), Cold Isostatic Pressing(CIP), cold pressing and sinter, Vacuum sinter, FZ, CZ, CVD，vacuum forging ......

Company Information

  • Contact Person:Yolanda Yuan
  • Department:Manager
  • Telephone:
  • Mobile Phone:
  • Fax:
  • Business Type:Manufacturing
  • Year Established:2008
  • Number Of Employees:26-50
  • Trade Capacity:Export Percentage:80% %
  • Production Capacity:7
  • R&D Capacity:21 - 30 people
  • Quality Control:Third Parties
  • No. of QC Staff:21 - 30 people
  • Certificates:ISO9000
  • Contract Manufacturing:OEM Service Offered
  • Registered Capital:25 - 50 Million USD
  • Legal Representative / CEO:David Shu
  • Total Annual Sales Volume:25 - 50 Million USD
  • Main Products:Sputtering Target,Alloy,Pure Metal,Ceramic,Semiconductor Etc, Ceramic,Metal,Alloy,Semiconductor
  • Address:Gaoxin department Nanchang Jiangxi, Nanchang, Jiangxi, China
  • Main Markets:Americas,Africa,Asia,Caribbean,America,Europe,Midd
  • Location:Nanchang
  • Website:Visit website

Product

  • Diameter 50.8mm Pd target99.99%-Palladium target-sputtering target(Mat-cn)
  • High purity sputtering target ---- Graphite crucible
  • High purity sputtering target --- ATO 99.99% (Mat-cn)
  • High purity sputtering target --- MoS2 target Molybdenum Disulfide target (Mat-cn)
  • High purity sputtering target for laboratory coating ------ LiF target
  • High purity CaF2 target sputtering target ----- 99.99% CaF2 target
  • The finishing surfac- SiC target -sputtering target
  • High density 99.99% purity of CeO2 target ----- sputtering target
  • Low tolerance Titanium Dioxide target ------ sputtering target
  • Low tolerance ZnO target-High density Zniz oxide target-sputtering target
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